Alumina ceramics have high Mohs hardness, strong compressive capacity, high resistivity and good insulation, which are widely used in the manufacture of various precision tools, and also made into alumina ceramic substrates, which are widely used in the field of electronic consumption.

Another Kona Ceramic Polishing Slurry base on silica colloidal provides a highly smooth surface for alumina ceramic final polishing.

POLISHING SLURRY FOR CERAMICS FEATURES

Kona water-based alumina slurry has been designed for polishing ceramic components, such as Aluminum Nitride and Alumina Ceramic substrates.

Ceramics is a hard material (Mohs hardness 7~9), so it is challenging to obtain a smooth surface with traditional mechanical polishing techniques.

Kona Ceramic Polishing Slurry based on nano alumina abrasives provides an improved polishing rate compared to silica colloidal with no compromise on a smooth surface.

Another Kona Ceramic Polishing Slurry base on silica colloidal provides a highly smooth surface for ceramic final polishing.

POLISHING SLURRY FOR ALUMINA CERAMIC APPLICATIONS

Polishing Slurry for Alumina Ceramic Applications

Alumina Ceramic is a hard material ( mohs hardness 9 ), so it is a challenging to obtain a smooth surface by traditional mechanical polishing techniques.

This Kona water-based alumina slurry has been designed for polishing alumina ceramic components, such as Alumina Ceramic substrates, Alumina Ceramic Seal Ring and so on.

Our alumina polishing powders are also available for ceramic polishing, as well as alumina slurry.

We also have Polishing Slurry base on silica colloidal provides a highly smooth surface for ceramic final polishing.

If you want to know more details of alumina suspension for polishing, please visit our website.

Kona series Sapphire Polishing Slurry is developed for kinds of Sapphire products, such as the sapphire lens and sapphire substrate. Our Colloidal silica provides a good surface finish with no compromise with polish rate, and alumina slurry is especially suitable for C-plane sapphire with a fast removal rate and controlled surface finish.